Sputtering Targets | Sputtering Method | Sputtering Process | Sputtering Method and Its Process
A sputtering target is a material that is used for making thin films in a procedure known as sputter deposition or shrill film deposition. During this procedure, the sputtering target supply, which starts as a solid, is smashed up by gaseous ions into small particles that form a spray and coat additional material, which is recognized as the substrate.
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